Our group uses the following facilities in the Applied Science Building, Burnaby:
- Multi-chamber cluster deposition tool consisting of plasma-enhanced chemical vapor deposition (PECVD) for doped and undoped thin film Si deposition, a magnetron sputtering chamber for ITO deposition, and high temperature evaporator system for 2D material growth.
- Chemical Vapor Deposition system for monolayer WS2 growth
- Chemical Vapor Deposition system for monolayer TMD growth
Material and Device characterization:
- Photoluminescence for visible and infrared (wavelength of up to 1700nm)
- Transmission, Reflectance, Absorption using an integrated sphere in the visible (300-1100nm) and infrared regions (900-1700nm)
- Temperature control stage (70K to Room Temp.) with vacuum
- Solar simulator (AM1.5 Global) and External Quantum Efficiency measurements
- Quartz Crystal Microbalance measurements for liquids
- Probe Station.
Engineering Science Cleanroom shared facilities:
- mask aligners for photolithography
- reactive ion etch (RIE)
- wet etch processes (fume hood)
- deep reactive ion etch (DRIE)
- XeF2 etch
- Dektak thickness profiler
- four point probe
- Atomic Force Microscope.
A variety of fabrication and characterization equipment is also available at SFU’s 4DLABs (www.4dlabs.ca) located two buildings away.