Facilities

Our group uses the following facilities in the Applied Science Building, Burnaby:

Fabrication equipment:

  • Multi-chamber cluster deposition tool consisting of plasma-enhanced chemical vapor deposition (PECVD) for doped and undoped thin film Si deposition, a magnetron sputtering chamber for ITO deposition, and high temperature evaporator system for 2D material growth.
  • Chemical Vapor Deposition system for monolayer WS2 growth
  • Chemical Vapor Deposition system for monolayer TMD growth

Material and Device characterization:

  • Photoluminescence for visible and infrared (wavelength of up to 1700nm)
  • Transmission, Reflectance, Absorption using an integrated sphere in the visible (300-1100nm) and infrared regions (900-1700nm)
  • Temperature control stage (70K to Room Temp.) with vacuum
  • Solar simulator (AM1.5 Global) and External Quantum Efficiency measurements
  • Quartz Crystal Microbalance measurements for liquids
  • Probe Station.

Engineering Science Cleanroom shared facilities:

  • mask aligners for photolithography
  • reactive ion etch (RIE)
  • wet etch processes (fume hood)
  • deep reactive ion etch (DRIE)
  • XeF2 etch
  • Dektak thickness profiler
  • four point probe
  • Atomic Force Microscope.

A variety of fabrication and characterization equipment is also available at SFU’s 4DLABs (www.4dlabs.ca) located two buildings away.